Study of alternating phase-shift mask structure for 65-nm node devices
- Author(s):
Konishi, T. ( Toppan Printing Co., Ltd. (Japan) ) Komizo, T. ( Toppan Printing Co., Ltd. (Japan) ) Takahashi, H. ( Toppan Printing Co., Ltd. (Japan) ) Morita, M. ( Toppan Printing Co., Ltd. (Japan) ) Ohshima, T. ( Toppan Printing Co., Ltd. (Japan) ) Chiba, K. ( Toppan Printing Co., Ltd. (Japan) ) Kojima, Y. ( Toppan Printing Co., Ltd. (Japan) ) Sasaki, J. ( Toppan Printing Co., Ltd. (Japan) ) Tanaka, K. ( Toppan Printing Co., Ltd. (Japan) ) Otaki, M. ( Toppan Printing Co., Ltd. (Japan) ) Okuda, Y. ( Toppan Printing Co., Ltd. (Japan) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 880
- Page(to):
- 888
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.2
- Type:
- Conference Proceedings
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