Blank Cover Image

Mask challenges and capability development for the 65-nm device technology node: the first status report

Author(s):
Kim, W.D. ( Texas Instruments Inc. (USA) )
Aquino, C.M. ( KLA-Tencor Corp. (USA) )
Eickhoff, M.D. ( KLA-Tencor Corp. (USA) )
Lim, P. ( KLA-Tencor Corp. (USA) )
Fukuhara, N. ( Toppan Printing Co., Ltd. (Japan) )
Jessen, S.W. ( Texas Instruments Inc. (USA) )
Kikuchi, Y. ( Toppan Printing Co., Ltd. (Japan) )
Tanzawa, J. ( Toppan Printing Co., Ltd. (Japan) )
3 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
859
Page(to):
870
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Mask inspection challenges for 90- and 130-nm device technology nodes: inspection sensitivity and printability study using SEMI standard programmed defect masks

Kim, W.D., Akima, S., Aquino, C.M., Becker, C., Eickhotf, M.D., Narita, T., Quah, S.-K., Rohr, P.M., Schlaffer, R., …

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Post Cu-CMP Engineering Challenges for the 65 nm Technology Nodes and Beyond

S. Petitdidier, M. Mellier, D. Guiheux, M. Juhel

Electrochemical Society
2 Conference Proceedings Advanced reticle inspection challenges and solutions for 65nm node [5992-12]

Kim, W. D., Eickhoff, M. D., Kim, D., McCurley, S.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Evaluation of SCAA mask technology as a pathway to the 65-nm node

Beach, J.V., Petersen, J.S., Maslow, M.J., Gerold, D.J., McCafferty, D.C.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Wafer FAB experience of implementing 50-Vk vector e-beam mask writer and bry etch process for 130-nm technology node generation

Kim,W.D., Bennett,B.D., Ma,M.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings First review of a suitable metrology framework for the 65-nm technology node

Severgnini, E., Vasconi, M., Herisson, D., Thony, P.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Required mask specification for mass production devices below 65-nm design node [6349-81]

Nam, D., Choi, S., Doh, J., Noh, Y., Lee, H., Sin, Y., Kim, B., Kang, M., Han, W.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Extended capability of laser writer for masks beyond 180-nm nodes

Cho,S.-Y., Lee,J.-Y., Kim,C.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Aerial image degradation effects due to imperfect sidewall profiles of EAPSM mask for 130-nm device node: 3D EMF simulations and wafer printing results

Kim, W.D., Rathsack, B.M.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Mask repair for the 65 nm technology node [5992-171]

Robinson, T., Dinsdale, A., Bozak, R., White, R., Lee, D. A., Roessler, K.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Application of CPL reticle technology for the 65- and 50-nm node

Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., …

SPIE-The International Society for Optical Engineering
12 Conference Proceedings 130-nm node mask development

Chabala,J.M., Weaver,S., Alexander,D., Lu,M., Kim,N.-W., Cole,D.M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12