Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node
- Author(s):
Croffie, E.H. ( LSI Logic Corp. (USA) ) Eib, N. ( LSI Logic Corp. (USA) ) Callan, N.P. ( LSI Logic Corp. (USA) ) Baba-Ali, N. ( ASML (USA) ) Latypov, A. ( ASML (USA) ) Hintersteiner, J. ( ASML (USA) ) Sandstrom, T. ( Micronic Laser Systems AB (Sweden) ) Bleeker, A. ( ASM-Lithography Research (Netherlands) ) Cummings, K.D. ( ASML (USA) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 842
- Page(to):
- 850
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.2
- Type:
- Conference Proceedings
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