Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
- Author(s):
Montgomery, P.K. ( IMEC (Belgium) ) Lucas, K.D. ( Motorola, Inc. (USA) ) Litt, L.C. ( Motorola, Inc. (USA) ) Conley, W. ( Motorola, Inc. (USA) ) Fanucchi, E. ( Motorola, Inc. (USA) ) Van Wingerden, J. ( Philips Research Labs. (Belgium) ) Vandenberghe, G. ( IMEC (Belgium) ) Wiaux, V. ( IMEC (Belgium) ) Taylor, D. ( Photronics, Inc. (USA) ) Cangemi, M.J. ( Photronics, Inc. (USA) ) Kasprowicz, B. ( Photronics, Inc. (USA) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 814
- Page(to):
- 825
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.2
- Type:
- Conference Proceedings
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