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Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode

Author(s):
Montgomery, P.K. ( IMEC (Belgium) )
Lucas, K.D. ( Motorola, Inc. (USA) )
Litt, L.C. ( Motorola, Inc. (USA) )
Conley, W. ( Motorola, Inc. (USA) )
Fanucchi, E. ( Motorola, Inc. (USA) )
Van Wingerden, J. ( Philips Research Labs. (Belgium) )
Vandenberghe, G. ( IMEC (Belgium) )
Wiaux, V. ( IMEC (Belgium) )
Taylor, D. ( Photronics, Inc. (USA) )
Cangemi, M.J. ( Photronics, Inc. (USA) )
Kasprowicz, B. ( Photronics, Inc. (USA) )
6 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. date:
2003
Page(from):
814
Page(to):
825
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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