Investigation of an enhanced mask data preparation system using unified mask data formats

Investigation of an enhanced mask data preparation system using unified mask data formats

Author(s):

Suzuki, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kuriyama, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Hirumi, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kawase, H. ( Seiko Instruments Inc. (Japan) )

Kamimoto, T. ( Seiko Instruments Inc. (Japan) )

1 more

Publication title:

23rd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5256

Pub. Year:

2003

Page(from):

785

Page(to):

792

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

Language:

English

Call no.:

P63600/5256.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013601
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2003 : 23rd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2003.09.09-2003.09.12

Similar Items:

1 Conference Proceedings Improvement of unified mask data formats for EB writers Suzuki, T., Hirumi, J., Yoshioka, N., Hojyo, Y., Kawase, Y., Hara, S., Kuriyama, K., Hoga, M., Watanabe, S.W., Kawase, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Application of the unified mask data format based on OASIS for VSB EB writers [5992-195] Suzuki, T., Hirumi, J., Suga, O. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Unified mask data formats for EB writers Kuriyama, K., Suzuki, T., Hirumi, J., Yoshioka, N., Hojo, Y., Kawase, Y., Hara, S., Hoga, M., Watanabe, S.W., Inoue, M., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Shot number analysis at 65-nm node mask writing using VSB writer Hirumi, J., Kuriyama, K., Yoshioka, N., Yoshikawa, R., Hojo, Y., Matuzaka, T., Tanaka, K., Hoga, M. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Enhancement of unified mask data formats for EB writers Suzuki, T., Hirumi, J., Yoshioka, N., Hojyo, Y., Kawase, Y., Sakamoto, S., Kuriyama, K., Narukawa, S., Houga, M. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Extending OASIS for the unification of mask data representation Sahouria, E., Schulze, S., Suzuki, T., Hirumi, J. SPIE - The International Society of Optical Engineering
4 Conference Proceedings GDS2NEO: high-compression data processing system for a new EB handling format Kawase, H., Kamimoto, T., Ogasawara, H., Kuriyama, K., Hirumi, J., Yoshioka, N. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Evaluation of mask data preparation with OASIS and P10 [5853-46] Kuriyama, K., Machiya, Y., Yamasaki, K., Narukawa, S., Hayashi, N. SPIE - The International Society of Optical Engineering
5 Conference Proceedings The unified mask data format based on OASIS for VSB EB writers [5853-101] Suzuki, T., Hirumi, J., Hojyo, Y., Kawase, Y., Sakamoto, S., Kuriyama, K., Narukawa, S., Hoga, M. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection … Tojo, T., Hirano, R., Tsuchiya, H., Oaki, J., Nishizaka, T., Sanada, Y., Matsuki, K., Isomura, I., Ogawa, R., Kobayashi, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Development of new stream format with GDSII upper compatibility and high compression rate Kuriyama, K., Hirumi, J., Yoshioka, N., Hojo, Y., Kawase, Y., Hara, S., Hoga, M., Watanabe, S.W., Inoue, M., Kawase, H., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system Hara,S., Murakami,E., Magoshi,S., Koyama,K., Anze,H., Ogawa,Y., Kabeya,A., Ooki,S., Saito,T., Fujii,T., Sakamoto,S., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12