Mask-making study for the 65-nm node
- Author(s):
Chen, C.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lee, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lu, C.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hsieh, R.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chen, W.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, B.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 673
- Page(to):
- 683
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.1
- Type:
- Conference Proceedings
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