Comparative evaluation of mask cleaning performance

Comparative evaluation of mask cleaning performance

Author(s):

Jeong, W.-G. ( Photronics-PKL Co., Ltd. (South Korea) )

Park, D.- ( Photronics-PKL Co., Ltd. (South Korea) )

Park, E.-S. ( Photronics-PKL Co., Ltd. (South Korea) )

Cho, Y.-W. ( Photronics-PKL Co., Ltd. (South Korea) )

Choi, S.-J. ( Photronics-PKL Co., Ltd. (South Korea) )

Kwon, H.-J. ( Photronics-PKL Co., Ltd. (South Korea) )

Kim, J.-M. ( Photronics-PKL Co., Ltd. (South Korea) )

Choi, S.-S. ( Photronics-PKL Co., Ltd. (South Korea) )

3 more

Publication title:

23rd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5256

Pub. Year:

2003

Page(from):

510

Page(to):

517

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

Language:

English

Call no.:

P63600/5256.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013600
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2003 : 23rd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2003.09.09-2003.09.12

Similar Items:

1 Conference Proceedings Comparative evaluation of mask production CAR development processes with stepwise defect inspection Jeong, W.-G., Lee, J.-K., Park, D.I., Park, E.-S., Lee, J.-H., Seo, S.-K., Lee, D.-H., Kim, J.-M., Choi, S.S., Jeong, … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Comparative study on MEEF and dose latitude between attenuated PSM and Cr Binary masks Cho,H.-J., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production Jeong, W.-G., Park, D.-I., Park, E.-S., Seo, S.-K., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S. SPIE-The International Society for Optical Engineering	8 Conference Proceedings A study of post-exposure baking effect for CAR process in photomask fabrication Park, D.-I., Seo, S.-K., Jeong, W.-G., Park, E.-S., Lee, J.-H., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks Jeong,W.G., Lee,S.W., Kim,D.H., Yoon,Y.J., Lee,D.H., Choi,B.Y., Choi,S.-S., Jung,S.M., Jeong,S.-H. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process Park, D.-I., Park, E.-S., Lee, J.-H., Jeong, W.-G., Seo, S.-K., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process Jeong, W.-G., Kim, D.-W., Park, C.-M., An, K.-W., Lee, D.-H., Kim, J.-M., Choi, S.-S., Jeong, S.H. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Optimum PEC conditions under resist heating effect reduction for 90-nm-node mask writing Park, E.S., Lee, J.H,, Park, D.I., Jeong, W.-G., Seo, S.K., Kim, S.-S., Choi, S.-S., Jeong, S.-H. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Study of mask structure for 45-nm node based on manufacturability and lithographic performance J. G. Doh, C. H. Park, Y. S. Moon, B. H. Kim, S. W. Kwon, S. Y. Choi, S. H. Kim, S. Y. Kim, B. G. Kim, S. G. Woo, H. K. … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes Choi, Y.-H., Park, J.R., Sung, M.-G., Yang, S.-H., Kim, S.-H., Lee, H.-J., Lee, J.-Y., Jang, I.Y., Kim, Y.H., Choi, … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Defects analysis of mask blanks Lee,D.H., Kim,D.W., Lee,J.K., Jeong,W.G., Choi,S.-S., Jung,S.-M., Jeong,S.-H. SPIE-The International Society for Optical Engineering	12 Conference Proceedings EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12