Blank Cover Image

Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing

Author(s):
Kim, Y.-D. ( Photronics-PKL Co., Ltd. (South Korea) )
Lee, D.-S. ( Photronics-PKL Co., Ltd. (South Korea) )
Park, D.-I. ( Photronics-PKL Co., Ltd. (South Korea) )
Kwon, H.-J. ( Photronics-PKL Co., Ltd. (South Korea) )
Kim, J.-M. ( Photronics-PKL Co., Ltd. (South Korea) )
Jung, S.-M. ( Photronics-PKL Co., Ltd. (South Korea) )
Choi, S.-S. ( Photronics-PKL Co., Ltd. (South Korea) )
2 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
392
Page(to):
399
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Park, D.-I., Park, E.-S., Lee, J.-H., Jeong, W.-G., Seo, S.-K., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings 90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process

Park, D.-I., Seo, S.-K., Park, E.-S., Lee, J.-H., Jeong, W.-G., Kim, J.-M., Choi, S.-S., Jeong, S.-H.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings A study of post-exposure baking effect for CAR process in photomask fabrication

Park, D.-I., Seo, S.-K., Jeong, W.-G., Park, E.-S., Lee, J.-H., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process

Jeong, W.-G., Kim, D.-W., Park, C.-M., An, K.-W., Lee, D.-H., Kim, J.-M., Choi, S.-S., Jeong, S.H.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Lee, D. W., Jung, H. Y., Kim, M. S., Lee, J. S., Choi, Y. K., Han, O.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Evaluation of EA-PSM opaque repair on 90-nm lithography

Kim, D.-W., Lee, J.-K., Koo, S.H., Lee, D.-H., Kim, J.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production

Jeong, W.-G., Park, D.-I., Park, E.-S., Seo, S.-K., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings 130-nm node mask development

Chabala,J.M., Weaver,S., Alexander,D., Lu,M., Kim,N.-W., Cole,D.M.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell

Lee, J.-H., Chung, D.-H., Cha, D.-C., Kim, H.-S., Park, J.-S., Nam, D.-G., Woo, S.-K., Cho, H.-S., Han, W.-S.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Optical performance enhancement technique for 45-nm-node with binary mask

J. Jung, H. Kim, J. Lee, S. Choi, W. Han

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing

Kim, Y.-D., Kim, D.-W., Lee, D.-S., Jang, P.-J., Kwon, H.-J., Cho, H.-J., Kim, J.-M., Choi, S.-S.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process

Kim,J., Kim,S.-C., Kim,H.-C., Lee,S.-I., Choi,Y.-K., Ham,Y.-M., Han,O.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12