Resist process optimization for a DUV laser pattern generator

Resist process optimization for a DUV laser pattern generator

Author(s):

Fosshaug, H.A. ( Micronic Laser Systems AB (Sweden) )

Bajramovic, A. ( Micronic Laser Systems AB (Sweden) )

Karlsson, J. ( Micronic Laser Systems AB (Sweden) )

Xing, K. ( Micronic Laser Systems AB (Sweden) )

Rosendahl, A. ( Micronic Laser Systems AB (Sweden) )

Dahlberg, A. ( Micronic Laser Systems AB (Sweden) )

Bjoernberg, C. ( Micronic Laser Systems AB (Sweden) )

Bjuggren, M. ( Micronic Laser Systems AB (Sweden) )

Sandstrom, T. ( Micronic Laser Systems AB (Sweden) )

4 more

Publication title:

23rd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5256

Pub. Year:

2003

Page(from):

355

Page(to):

365

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

Language:

English

Call no.:

P63600/5256.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013600
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2003 : 23rd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2003.09.09-2003.09.12

Similar Items:

1 Conference Proceedings FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator Karlsson, J. O., Xing, K., Bajramovic, A., Dahlberg, H., Bjornberg, C., Hogfeldt, P., Kjellberg, L., Fosshaug, H., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the Sigma7300 DUV mask writer [5853-04] Xing, K., Karlsson, J., Paulson, A., Bjornberg, C., Lundvall, A., Hogfeldt, P., Vedenpaa, J., Goodoree, R., Bjuggren, M. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator Fosshaug, H., Askebjer, P., Karlsson, J., Bajramovic, A., Xing, K., Eklund, R., Walford, J., Ekberg, M., Hogfeldt, P., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator Sjoberg, H., Chauvet, J.-M., Harkesjo, J., Hogfeldt, P., Karawajczyk, A., Karlsson, J., Kjellberg, L., Mahlen, J., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator Bjyrnyngen, P., Ekberg, M., ystrym, T., Fosshaug, H.A., Karlsson, J., Bjyrnberg, C., Nikolajeff, F.K., Karlsson, M. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator Ekberg, M., Fosshaug, H.A., Ostrom, T., Bjornangen, P., Utterback, T., Skotte, P.-U., Higley, J., Ruede, D., Kishkovich, … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Evaluation of attenuated PSM photomask blanks with TF11 chrome and FEP-171 resist on a 248 nm DUV laser pattern generator K. Xing, C. Björnborg, H. Karlsson, A. Paulsson, A. Rosendahl Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Managing effects in CD control from PED and PEB in advanced DUV photomask manufacturing using FEP-171 resist Adisa Paulsson, Kezhao Xing, Hans Fosshaug, Axel Lundvall, Charles Bjoernberg, Johan Karlsson SPIE - The International Society of Optical Engineering
5 Conference Proceedings Transparent corner enhancement scheme for a DUV pattern generator Martinsson, H., Hellgren, J., Eriksson, N., Bjuggren, M., Sandstrom, T. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Evaluation of TF11 attenuated-PSM mask blanks with DUV laser patterning K. Xing, C. Björnberg, H. Karlsson, A. Paulsson, P. Beiming Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes Aman, J., Fosshaug, H.A., Hedqvist, T., Harkesjo, J., Hogfeldt, P., Jacobsson, M., Karawajczyk, A., Karlsson, J., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Anti-bubble topcoat for immersion lithography Paulsson, A., Xing, K., Fosshaug, H., Lundvall, A., Bjornberg, C., Karlsson, J. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12