Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)

Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)

Author(s):

Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )

Socha, R. ( ASML MaskTools, Inc. (USA) )

Hsu, S.D. ( ASML MaskTools, Inc. (USA) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Laidig, T.L. ( ASML MaskTools, Inc. (USA) )

Corcoran, N. ( ASML MaskTools, Inc. (USA) )

Hollerbach, U. ( ASML MaskTools, Inc. (USA) )

Wampler, K.E. ( ASML MaskTools, Inc. (USA) )

Shi, X. ( ASML MaskTools, Inc. (USA) )

4 more

Publication title:

23rd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5256

Pub. Year:

2003

Page(from):

297

Page(to):

308

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

Language:

English

Call no.:

P63600/5256.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013600
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2003 : 23rd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2003.09.09-2003.09.12

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