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Mask pattern fidelity quantification

Author(s):
Wang, W.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chang, S.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chin, C.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lu, C.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chin, A.S.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yu, S.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
2 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
266
Page(to):
275
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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