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Efficient mask data preparation for variable shaped e-beam writing system focusing on memory devices

Author(s):
Jang, T.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.-B. ( Samsung Electronics Co., Ltd. (South Korea) )
Shin, J.-P. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoo, K.-J. ( Samsung Electronics Co., Ltd. (South Korea) )
Jung, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoo, M.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kong, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
143
Page(to):
150
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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