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Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography

Author(s):
Park, J.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Shin, I.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Shin, H.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Laidig, T.L. ( ASML Masktools, Inc. (USA) )
Van den Broeke, D.J. ( ASML Masktools, Inc. (USA) )
Chen, J.F. ( ASML Masktools, Inc. (USA) )
5 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. date:
2003
Page(from):
112
Page(to):
121
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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