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Implementing AAPSM in 90-nm product with practical image imbalance correction

Author(s):
Lin, B.S. ( United Microelectronics Corp. (Taiwan) )
Hsu, S.- ( United Microelectronics Corp. (Taiwan) )
Huang, I.H. ( United Microelectronics Corp. (Taiwan) )
Chen, K. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Hsu, T. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Liu, H.-Y. ( Synopsys, Inc. (USA) )
Kroyan, A. ( Synopsys, Inc. (USA) )
Hsu, F. ( Synopsys, Inc. (USA) )
Huang, J. ( Synopsys, Inc. (USA) )
5 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
103
Page(to):
111
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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