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Integrated phase shift measurements for advanced mask etch process control

Author(s):
Sahin, T. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Collard, C. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Anderson, S.A. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Mak, A.W. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Brooks, C.B. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Buie, M.J. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Walsh, P. ( n&k Technology, Inc. (USA) )
Li, G. ( n&k Technology, Inc. (USA) )
3 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
76
Page(to):
84
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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