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Optimization of a 65-nm alternating phase-shift quartz etch process

Author(s):
Anderson, S.A. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Anderson, S.A., III ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Buie, M.J. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Chandrachood, M. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Clevenger, J.O. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Lee, Y. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Sandlin, N.L. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Ding, J. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
3 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
66
Page(to):
75
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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