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New method for approaching the loading-free process for photomask Cr etching

Author(s):
  • Jang, I.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Lee, J.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Moon, S.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
59
Page(to):
65
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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