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Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator

Author(s):
Kim, M.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Ki, W.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-H. ( Samsung Advanced Institute of Technology (South Korea) )
Choi, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. date:
2003
Page(from):
50
Page(to):
58
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.1
Type:
Conference Proceedings

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