DUV mask writer for BEOL 90-nm technology layers
- Author(s):
Hong, D. ( Cypress Semiconductor Corp. (USA) ) Krishnan, P. ( Cypress Semiconductor Corp. (USA) ) Coburn, D. ( Cypress Semiconductor Corp. (USA) ) Jeewakhan, N. ( Cypress Semiconductor Corp. (USA) ) Xie, S. ( Cypress Semiconductor Corp. (USA) ) Broussard, J. ( Cypress Semiconductor Corp. (USA) ) Ferguson, B. ( Cypress Semiconductor Corp. (USA) ) Green, K.G. ( DuPont Photomasks, Inc. (USA) ) Buck, P. ( DuPont Photomasks, Inc. (USA) ) Jackson, C.A. ( DuPont Photomasks, Inc. (USA) ) Martinez, L. ( DuPont Photomasks, Inc. (USA) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 9
- Page(to):
- 19
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.1
- Type:
- Conference Proceedings
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