EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing
- Author(s):
Kierey, H. ( Carl Zeiss Laser Optics GmbH (Germany) ) Heidemann, K.F. ( Carl Zeiss Laser Optics GmbH (Germany) ) Kleemann, B.H. ( Carl Zeiss Laser Optics GmbH (Germany) ) Winters, R. ( Carl Zeiss Laser Optics GmbH (Germany) ) Egle, W/J. ( Carl Zeiss Laser Optics GmbH (Germany) ) Singer, W. ( Carl Zeiss SMT AG (Germany) ) Melzer, F. ( Carl Zeiss SMT AG (Germany) ) Wevers, R. ( Carl Zeiss SMT AG (Germany) ) Antoni, M. ( Carl Zeiss SMT AG (Germany) ) - Publication title:
- Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5193
- Pub. Year:
- 2004
- Page(from):
- 70
- Page(to):
- 78
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819450661 [0819450669]
- Language:
- English
- Call no.:
- P63600/5193
- Type:
- Conference Proceedings
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