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Thin film 193nm TNK measurement using multi-domain genetic algorithm (MDGA) with a combination of beam profile reflectometry (BPR), absolute ellipsometry (AE), and spectroscopic ellipsometry (SE)

Author(s):
Opsal, J.L. ( Therma-Wave, Inc. (USA) )
Leng, J. ( Therma-Wave, Inc. (USA) )
Ke, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, P.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, J.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ku, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
1 more
Publication title:
Advanced characterization techniques for optics, semiconductors, and nanotechnologies : 3-5 August 2003, San Diego, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5188
Pub. Year:
2003
Page(from):
6
Page(to):
18
Pages:
13
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819450616 [0819450618]
Language:
English
Call no.:
P63600/5188
Type:
Conference Proceedings

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