Blank Cover Image

Wave-optical considerations in photolithography

Author(s):
Publication title:
Wave-optical wywtems engineering II : 3-4 August 2003, San Diego, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5182
Pub. Year:
2003
Page(from):
63
Page(to):
72
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819450555 [0819450553]
Language:
English
Call no.:
P63600/5182
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings The MEF revisited: low k1 effects versus mask topography effects

Pierrat, C., Wong, A.K.K.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Applicability of alternating phase shifting masks using polarized light [6154-164]

Bubke, K., Sczyrba, M., Pierrat, C

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Pellicle-induced aberrations and apodization in hyper NA optical lithography [6283-115]

Bubke, K., Alles, B, Cotte, E., Sczyrba, M., Pierrat, C.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Zernike coefficients:are they really enough?

Progler,C.J., Wong,A.K.

SPIE - The International Society for Optical Engineering
3 Conference Proceedings Proximity effects in alternating aperture phase-shifting masks

Pierrat,C.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Optically controlled microstrip slow wave structures

Verma,A.K., Sharma,E.K.

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Full phase-shifting methodology for 65-nm-node lithography

Pierrat, C.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks

Wong, A.K.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Alternating phase-shifting mask with reduced aberration sensitivity: lithography considerations

Wong,A.K., Liebmann,L.W., Molless,A.F.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Pulse propagation in optically controlled microstrip MIS slow-wave structures

Bhadauria, A., Sharma, E.K., Verma, A.K.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Recent advances in optical fiber amplifiers (Invited Paper)

Wang, C.-C., Srivastava, A.K., Chen, C.-J., Wong, W.S., Sun, Y.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Studies of reorientational mobilily of chromophores in poled nonlinear optical polymers by secondary poling [6331-18]

Wong, K. Y., To, C. -W.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12