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Multiple high-period-accuracy gratings fabricated by holographic exposure and ion-beam etching with nanometer depth accuracy in silicon

Author(s):
  • Haensel, T.J. ( Leibniz-Institute for Surface Modification (Germany) )
  • Schindler, A. ( Leibniz-Institute for Surface Modification (Germany) )
  • Dissing, B. ( Ibsen Photonics A/S (Denmark) )
Publication title:
Optical manufacturing and testing V : 3-5 August 2003, San Diego, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5180
Pub. Year:
2003
Page(from):
73
Page(to):
80
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819450531 [0819450537]
Language:
English
Call no.:
P63600/5180
Type:
Conference Proceedings

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