Batch Processing Method to Deposit a-Si:H Films by PECVD

Batch Processing Method to Deposit a-Si:H Films by PECVD

Author(s):

Raniero, L.

Publication title:

Advanced materials forum II : proceedings of the II International Materials Symposium, Materiais 2003 and XI Encontro Sociedade Portugesa de Materiais - SPM, Campus da Caparica, April 14-16, Caparica, Portugal, 2003

Title of ser.:

Materials science forum

Ser. no.:

455-456

Pub. Year:

2004

Page(from):

104

Page(to):

107

Pages:

4

Pub. info.:

Uetikon-Zuerich: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878499410 [0878499415]

Language:

English

Call no.:

M23650

Type:

Conference Proceedings

Details

TDL ID:	ZA00013362
Series ID:	PA00000012
Conf. info. (Name):	International Materials Symposium ; Encontro Sociedade Portugesa de Materiais - SPM
Conf. info. (Number):	2003 : 2nd ; 11th
Conf. info. (Venue):	Caparica, Portugal
Conf. info. (Date):	2003.04.14-2003.04.16

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