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Deposition of SiO2 and SiO2:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor

Author(s):
Publication title:
Advanced materials forum II : proceedings of the II International Materials Symposium, Materiais 2003 and XI Encontro Sociedade Portugesa de Materiais - SPM, Campus da Caparica, April 14-16, Caparica, Portugal, 2003
Title of ser.:
Materials science forum
Ser. no.:
455-456
Pub. Year:
2004
Page(from):
25
Page(to):
29
Pages:
5
Pub. info.:
Uetikon-Zuerich: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878499410 [0878499415]
Language:
English
Call no.:
M23650
Type:
Conference Proceedings

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