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Study on thermal control of x-ray mask during post-exposure bake

Author(s):
  • Wang, Y. ( Beijing Univ. of Aeronautics and Astronautics (China) )
  • Yu, J.
  • Yu, L.
  • Chen, D. ( Microelectronics R&D Ctr. of the Chinese Academy of Sciences (China) )
Publication title:
Fifth International Symposium on Instrumentation and Control Technology : 24-27 October 2003, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5253
Pub. Year:
2003
Page(from):
424
Page(to):
428
Pages:
5
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819451378 [0819451371]
Language:
English
Call no.:
P63600/5253
Type:
Conference Proceedings

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