Silicon waveguide fabrication process based on the anisotropic etching of Si- oriented wafers

Silicon waveguide fabrication process based on the anisotropic etching of Si<111>- oriented wafers

Author(s):

Cristea, D. ( National Institute for R&D in Microtechnologies (Romania) )
Obreja, P.
Manea, E.
Kusko, M.

Publication title:

Advanced topics in optoelectronics, microelectronics, and nanotechnologies : 21-23 November, 2002, Bucharest, Romania

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5227

Pub. Year:

2003

Page(from):

288

Page(to):

292

Pages:

5

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819451002 [0819451002]

Language:

English

Call no.:

P63600/5227

Type:

Conference Proceedings

Details

TDL ID:	ZA00013161
Series ID:	PA00000029
Conf. info. (Name):	Optoelectronics, microelectronics, and nanotechnologies
Conf. info. (Number):	2002
Conf. info. (Venue):	Bucharest, Romania
Conf. info. (Date):	2002.11.21-2002.11.23

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