Etching quartz with inductively coupled plasma etching equipment

Etching quartz with inductively coupled plasma etching equipment

Author(s):

Wu, X. ( Shanghai Institute of Optics and Fine Mechanics (China) )

Publication title:

Lithographic and micromachining techniques for optical component fabrication II : 3-4 August 2003, San Diego, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5183

Pub. Year:

2003

Page(from):

192

Page(to):

198

Pages:

7

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819450562 [0819450561]

Language:

English

Call no.:

P63600/5183

Type:

Conference Proceedings

Details

TDL ID:	ZA00013149
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Lithographic and Micromachining Techniques for Optical Component Fabrication
Conf. info. (Number):	2003 : 2nd
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	2003.08.03-2003.08.04

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