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Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks

Author(s):
Brooks, C.B. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
Anderson, S. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
Anderson, R.B. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
Collard, C. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
Clevenger, J. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
Sandlin, N.L. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
Buie, M.J. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
2 more
Publication title:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5148
Pub. Year:
2003
Page(from):
235
Page(to):
243
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819450180 [0819450189]
Language:
English
Call no.:
P63600/5148
Type:
Conference Proceedings

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