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Implementation of 248-nm based CD metrology for advanced reticle production

Author(s):
Hourd, A.C. ( Compugraphics International Ltd. (United Kingdom) )
Grimshaw, A. ( Compugraphics International Ltd. (United Kingdom) )
Scheuring, G. ( MueTec GmbH (Germany) )
Gittinger, C. ( MueTec GmbH (Germany) )
Doebereiner, S. ( MueTec GmbH (Germany) )
Hillmann, F. ( MueTec GmbH (Germany) )
Brueck, H.-J. ( MueTec GmbH (Germany) )
Hartmann, H. ( PDF Solutions GmbH (Germany) )
Ordynskyy, V. ( PDF Solutions GmbH (Germany) )
Peter, K. ( PDF Solutions GmbH (Germany) )
Chen, S.-B. ( Taiwan Mask Corp. (Taiwan) )
Chen, P.W. ( Taiwan Mask Corp. (Taiwan) )
Jonckheere, R.M. ( IMEC vzw (Belgium) )
Philipsen, V. ( IMEC vzw (Belgium) )
Schaetz, T. ( Infineon Technologies AG (Germany) )
Sommer, K. ( Karl Sommer Consulting (Germany) )
11 more
Publication title:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5148
Pub. date:
2003
Page(from):
148
Page(to):
157
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819450180 [0819450189]
Language:
English
Call no.:
P63600/5148
Type:
Conference Proceedings

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