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Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool

Author(s):
Scheuring, G. ( MueTec GmbH (Germany) )
Petrashenko, A. ( MueTec GmbH (Germany) )
Doebereiner, S. ( MueTec GmbH (Germany) )
Hillmann, F. ( MueTec GmbH (Germany) )
Brucek, H.-J. ( MueTec GmbH (Germany) )
Hourd, A.C. ( Compugraphics International Ltd. (United Kingdom) )
Grimshaw, A. ( Compugraphics International Ltd. (United Kingdom) )
Hughes, G. ( Compugraphics International Ltd. (United Kingdom) )
Chen, S.-B. ( Taiwan Mask Corp. (Taiwan) )
Chen, P.W. ( Taiwan Mask Corp. (Taiwan) )
Schaetz, T. ( Infineon Technologies AG (Germany) )
Struck, T. ( Infineon Technologies AG (Germany) )
Van Adrichem, P.J.M. ( Numerical Technologies Inc. (USA) )
Boerland, H. ( Numerical Technologies Inc. (USA) )
Lehnigk, S. ( Submicron Technologies GmbH (Germany) )
10 more
Publication title:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5148
Pub. date:
2003
Page(from):
138
Page(to):
147
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819450180 [0819450189]
Language:
English
Call no.:
P63600/5148
Type:
Conference Proceedings

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