Feature proximity errors on mask: assessment results of commercially obtained reticles
- Author(s):
- Jonckheere, R.M. ( IMEC vzw (Belgium) )
- Potoms, G. ( IMEC vzw (Belgium) )
- Philipsen, V. ( IMEC vzw (Belgium) )
- Publication title:
- 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5148
- Pub. Year:
- 2003
- Page(from):
- 128
- Page(to):
- 137
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819450180 [0819450189]
- Language:
- English
- Call no.:
- P63600/5148
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Extended defect printability study for 100-nm design rule using 193-nm lithography
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
2001 update on the SEMI Standards Mask Qualification Terminology Task Force
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Reliable subnanometer repeatability for CD metrology in a reticle production environment
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Implementation of 248-nm based CD metrology for advanced reticle production
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
4。゚reticles with 3% linewidth control for the development of 0.18-ヲフm lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
2002 update on the SEMI Standards Mask Qualification Terminology Task Force (Invited Paper)
SPIE-The International Society for Optical Engineering |