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Inspection of alternating phase-shift masks through the use of phase contrast techniques

Author(s):
Zurbrick, L.S. ( KLA-Tencor Corp. (USA) )
Rudzinski, M.W. ( KLA-Tencor Corp. (USA) )
Stokowski, S.E. ( KLA-Tencor Corp. (USA) )
He, L. ( International SEMATECH (USA) )
Kimmel, K.R. ( International SEMATECH (USA) )
Kashwala, N. ( International SEMATECH (USA) )
1 more
Publication title:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5148
Pub. Year:
2003
Page(from):
107
Page(to):
112
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819450180 [0819450189]
Language:
English
Call no.:
P63600/5148
Type:
Conference Proceedings

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