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Printability study for phase-shift masks at 193-nm lithography

Author(s):
Publication title:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5148
Pub. date:
2003
Page(from):
79
Page(to):
89
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819450180 [0819450189]
Language:
English
Call no.:
P63600/5148
Type:
Conference Proceedings

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