Development and characterization of new CD mask standards: a status report

Development and characterization of new CD mask standards: a status report

Author(s):

Schaetz, T. ( Infineon Technologies AG (Germany) )

Hauffe, B. ( Photronics MZD GmbH and Co. KG (Germany) )

Doebereiner, S. ( MueTec GmbH (Germany) )

Brueck, H.-J. ( MueTec GmbH (Germany) )

Brendel, B. ( Leica Microsystems Lithography GmbH (Germany) )

Bettin, L. ( Leica Microsystems Lithography GmbH (Germany) )

Roeth, K.-D. ( Leica Microsystems Wetzlar GmbH (Germany) )

Steinberg, W. ( Leica Microsystems Wetzlar GmbH (Germany) )

Speckbacher, P. ( Dr. Johannes Heidenhain GmbH (Germany) )

Sedlmeier, W. ( Dr. Johannes Heidenhain GmbH (Germany) )

Engel, T. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )

Haessler-Grohne, W. ( Physikalisch-Technische Bundesanstalt (Germany) )

Mirande, W. ( Physikalisch-Technische Bundesanstalt (Germany) )

Bosse, H. ( Physikalisch-Technische Bundesanstalt (Germany) )

9 more

Publication title:

19th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5148

Pub. Year:

2003

Page(from):

42

Page(to):

53

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819450180 [0819450189]

Language:

English

Call no.:

P63600/5148

Type:

Conference Proceedings

Details

TDL ID:	ZA00013133
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2003 : 19th
Conf. info. (Venue):	Sonthofen, Germany
Conf. info. (Date):	2003.01.13-2003.01.15

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