Semiconductor Metrology Requirements over the Next 15 Years

Semiconductor Metrology Requirements over the Next 15 Years

Author(s):: Diebold, A.C.
Publication title:: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5133
Pub. Year:: 2003
Page(from):: 409
Page(to):: 419
Pages:: 11
Pub. info.:: Pennington, NJ: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819449993 [0819449997]
Language:: English
Call no.:: P63600/5133
Type:: Conference Proceedings

Details

TDL ID:	ZA00013121
Series ID:	PA00000029
Conf. info. (Name):	ALTECH 2003 : Analytical Techniques for Semiconductor Materials and Process Characterization IV ; Meeting of the Electrochemical Society : Diagnostic Techniques for Semiconductor Materials and Devices VI
Conf. info. (Number):	2003 : 4th ; 202nd : 6th
Conf. info. (Venue):	Paris, France ; Salt Lake City, UT, USA
Conf. info. (Date):	2003.04.00 ; 2002.10.00

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