Application of X-Ray Fluorescence Spectrometry in Characterization of High-k Ultra-Thin Films

Application of X-Ray Fluorescence Spectrometry in Characterization of High-k Ultra-Thin Films

Author(s):

Zhao, C.

Publication title:

Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5133

Pub. Year:

2003

Page(from):

243

Page(to):

251

Pages:

9

Pub. info.:

Pennington, NJ: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449993 [0819449997]

Language:

English

Call no.:

P63600/5133

Type:

Conference Proceedings

Details

TDL ID:	ZA00013121
Series ID:	PA00000029
Conf. info. (Name):	ALTECH 2003 : Analytical Techniques for Semiconductor Materials and Process Characterization IV ; Meeting of the Electrochemical Society : Diagnostic Techniques for Semiconductor Materials and Devices VI
Conf. info. (Number):	2003 : 4th ; 202nd : 6th
Conf. info. (Venue):	Paris, France ; Salt Lake City, UT, USA
Conf. info. (Date):	2003.04.00 ; 2002.10.00

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