Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films

Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films

Author(s):

Blin, D.

Publication title:

Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5133

Pub. Year:

2003

Page(from):

233

Page(to):

242

Pages:

10

Pub. info.:

Pennington, NJ: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449993 [0819449997]

Language:

English

Call no.:

P63600/5133

Type:

Conference Proceedings

Details

TDL ID:	ZA00013121
Series ID:	PA00000029
Conf. info. (Name):	ALTECH 2003 : Analytical Techniques for Semiconductor Materials and Process Characterization IV ; Meeting of the Electrochemical Society : Diagnostic Techniques for Semiconductor Materials and Devices VI
Conf. info. (Number):	2003 : 4th ; 202nd : 6th
Conf. info. (Venue):	Paris, France ; Salt Lake City, UT, USA
Conf. info. (Date):	2003.04.00 ; 2002.10.00

Similar Items:

1 Conference Proceedings Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films Bun, D., Rochat, N., Rolland, G., Holliger, P., Martin, F., Damlencourt, J.-F., Lardin, T., Besson, P., Haukka, S., … Electrochemical Society	7 Conference Proceedings * Ultra Thin High-K Dielectrics Grown by Atomic Layer Deposition: A Comparative Study of ZrO2, HfO2, Y2O3 and Al2O3 Gusev, E.P., Canter, E., Copel, M., Gribelyuk, M., Buchanan, D.A., Okorn-Schmidt, H., D'Emic, C., Kozlowski, P., … Electrochemical Society
2 Conference Proceedings Atomic Vapor Deposition (AVDTM) process for High Performance HfO2 Dielectric Layers Cosnier, V., Dabertrand, K., Blonkowski, S., Lhostis, S., Zoll, S., Morand, Y., Descombes, S., Guillaumot, B., Hobbs, … Materials Research Society	8 Conference Proceedings Atomic Layer Deposition of Dielectrics and Electrodes for Embedded-DRAM Capacitor Cells in 90nm Technology and Beyond Gerritsen, E., Jourdan, N., Piazza, M., Fraboulet, D., Monsieur, F., Damlencourt, J.F., Martin, F., Mazaleyrat, E., … Electrochemical Society
3 Conference Proceedings (9.4) 11:40 - 12:00 PM - High Ge Content Si/SiGe Heterostructures for Microelectronics and Optoelectronics Purposes Bogumilowicz, Y., Hartmann, J.M., Damlencourt, J.F., Vandelle, B., Abbadie, A., Papon, A.-M., Rolland, G., Holliger, P., … Electrochemical Society	9 Conference Proceedings Fabrication and Characterization of Lead Sulfide Thin Films by Atomic Layer Deposition N.P. Dasgupta, S.P. Walch, F. Prinz Electrochemical Society
4 Conference Proceedings Hihg-Resolution Analysis of the HfO2-SiO2 Interface by Soft X-Ray Photoelectron Spectroscopy Renault, O., Samour, D., Damlencourt, J.-F., Papon, A.-M., Martin, F., Marthon, S., Blin, D., Barrett, N.T. SPIE-The International Society for Optical Engineering	10 Conference Proceedings 38 Structural and Electrical Properties of CVD-WNx Thin Films Deposited on High-K Materials Allegret, S., Rolland, G., Guidotti, E., Yamasaki, H., Holliger, P., Pierre, F., Martin, F. Electrochemical Society
5 Conference Proceedings Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques Bender, H., Conard, T., Richard, O., Brijs, B., Petry, J., Vandervorst, W., Defranoux, C., Boher, P., Rochat, N., Wyon, … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Wet-Cleaning and Surface Characterization of Si₁₋xGex Relaxed Alloys (x=0.2-0.5) After Polishing: Applications for SGOI and Strained Silicon Structures … A. Abbadie, J. M. Hartmann, P. Besson, D. Rouchon, P. Holliger, C. Di Nardo, T. Lardin, Y. Campidelli, B. Ghyselen, T. … Electrochemical Society
6 Conference Proceedings Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques Bender, H., Brijs, B., Peby, J., Vandervorst, W., Defranoux, C., Boher, P., Rochat, N., Wyon, C., Mack, P., … Electrochemical Society	12 Conference Proceedings High Growth Rate SiO₂ by Atomic Layer Deposition R. Matero, S. Haukka, M. Tuominen Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12