Proximity-effect correction for EPL by using multiple pattern-area-density maps and pattern classification

Proximity-effect correction for EPL by using multiple pattern-area-density maps and pattern classification

Author(s):

Murai, F. ( Hitachi, Ltd. (Japan) )
Fukuda, H. ( Hitachi, Ltd. (Japan) )
Mori, S. ( Hitachi ULSI Systems Co., Ltd. (Japan) )
Sato, A. ( Hitachi ULSI Systems Co., Ltd. (Japan) )
Nakajo, K. ( Hitachi ULSI Systems Co., Ltd. (Japan) )

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

888

Page(to):

897

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings

Details

TDL ID:	ZA00013118
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2003 : 10th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2003.04.16-2003.04.18

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