Low k1 lithography patterning option for the 90-nm and 65-nm nodes

Low k1 lithography patterning option for the 90-nm and 65-nm nodes

Author(s):

Hsu, S.D. ( ASML MaskTools, Inc. (USA) )

Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )

Shi, X. ( ASML MaskTools, Inc. (USA) )

Hsu, M. ( ASML MaskTools, Inc. (USA) )

Wampler, K.E. ( ASML MaskTools, Inc. (USA) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Yu, A. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Yang, S.C. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

4 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

812

Page(to):

828

Pages:

17

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings

Details

TDL ID:	ZA00013118
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2003 : 10th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2003.04.16-2003.04.18

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