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Practical approach for AAPSM image imbalance correction for sub-100-nm lithography

Author(s):
Cho, H.L. ( Toppan Chungwha Electronics Co. (Taiwan) )
Lin, S.Y. ( Toppan Chungwha Electronics Co. (Taiwan) )
Hsieh, F. ( Toppan Chunghwa Electronics Co. (Taiwan) )
Kroyan, A. ( Synopsys, Inc. (USA) )
Liu, H.-Y. ( Synopsys, Inc. (USA) )
Huang, J.H. ( Synopsys, Inc. (USA) )
Hsu, S.-H. ( UMC (Taiwan) )
Huang, I-H. ( UMC (Taiwan) )
Lin, B.S.-M. ( UMC (Taiwan) )
Hung, K.-C. ( UMC (Taiwan) )
5 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
778
Page(to):
786
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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