Pattern-dependence optical phase effect on alternating phase shift mask

Pattern-dependence optical phase effect on alternating phase shift mask

Author(s):

Chang, B.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

You, J.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Lu, M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Lee, C.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Kung, L.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Shu, K.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Shin, J.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

4 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

745

Page(to):

755

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings

Details

TDL ID:	ZA00013118
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2003 : 10th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2003.04.16-2003.04.18

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