Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography
- Author(s):
- Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5130
- Pub. Year:
- 2003
- Page(from):
- 736
- Page(to):
- 744
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- Language:
- English
- Call no.:
- P63600/5130
- Type:
- Conference Proceedings
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