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Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device

Author(s):
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, H.-D. ( Samsung Electronics Co., Ltd. (South Korea) )
Chung, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. date:
2003
Page(from):
727
Page(to):
735
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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