Resist heating dependence on subfield scheduling in 50-kV electron beam maskmaking

Resist heating dependence on subfield scheduling in 50-kV electron beam maskmaking

Author(s):

Babin, S.V. ( Soft Services (USA) )
Kahng, A.B. ( Univ. of California, San Diego (USA) )
Mandoiu, I. ( Univ. of California, San Diego (USA) )
Muddu, S.V. ( Univ. of California, San Diego (USA) )

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

718

Page(to):

726

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings

Details

TDL ID:	ZA00013118
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2003 : 10th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2003.04.16-2003.04.18

Similar Items:

1 Conference Proceedings Subfield scheduling for throughput maximization in electron-beam photomask fabrication Babin, S.V., Kahng, A.B., Mandoiu, I.I., Muddu, S. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography Babin,S.V., Weber,M., Koops,H.W.P. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Simulation of resist heating in electron-beam lithography Babin,S.V., Kuzmin,I.Yu. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Photomask fabrication of focusing diffractive optical elements using electron-beam lithography S.V. Babin, V.A. Danilov Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Advanced model for resist heating effect simulation in electron-beam lithography Babin,S.V., Kozunov,V.V., Kuzmin,I.Yu. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Throughput optimization of electron-beam lithography in photomask fabrication regarding acceptable accuracy of critical dimensions Babin,S.V., Kuzmin,I.Y. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Predictive modeling of lithography-induced linewidth variation A. B. Kahng, S. V. Muddu Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Molecular Weight Dependence of Electron-Beam Resist Sensitivity Rodriguez, F., Dems, B. C., Krasnopoler, A. A., Namaste, Y. M. N., Obendorf, S. K. American Chemical Society
5 Conference Proceedings Comparison of writing strategies subject to resist heating Babin,S.V. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography Koops,H.W.P., Babin,S.V., Weber,M., Dahm,G., Holopkin,A., Lyakhov,M.N. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Initial benchmarking of a new electron-beam raster pattern generator for 130-to 100-nm maskmaking Sauer,C.A., Abboud,F.E., Babin,S.V., Chakarian,V., Ghanbari,A., Innes,R., Trost,D., III,F.Raymond SPIE - The International Society for Optical Engineering	12 Conference Proceedings Modeling edge placement error distribution in standard cell library [6156-57] Gupta, P., Kahng, A. B., Muddu, S. V., Nakagawa, S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12