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GDS2NEO: high-compression data processing system for a new EB handling format

Author(s):
Kawase, H. ( Seiko Instruments Inc. (Japan) )
Kamimoto, T. ( Seiko Instruments Inc. (Japan) )
Ogasawara, H. ( Seiko Instruments Inc. (Japan) )
Kuriyama, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hirumi, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
638
Page(to):
647
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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