Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)
- Author(s):
Kotani, T. ( Toshiba Corp. (Japan) ) Ichikawa, H. ( Toshiba Microelectronics Corp. (Japan) ) Urakami, T. ( Toshiba Microelectronics Corp. (Japan) ) Nojima, S. ( Toshiba Corp. (Japan) ) Kobayashi, S. ( Toshiba Microelectronics Corp. (Japan) ) Oikawa, Y. ( Toshiba Corp. (Japan) ) Tanaka, S. ( Toshiba Corp. (Japan) ) Ikeuchi, A. ( Toshiba Microelectronics Corp. (Japan) ) Suzuki, K. ( Toshiba Corp. (Japan) ) Inoue, S. ( Toshiba Corp. (Japan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5130
- Pub. Year:
- 2003
- Page(from):
- 628
- Page(to):
- 637
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- Language:
- English
- Call no.:
- P63600/5130
- Type:
- Conference Proceedings
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