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Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)

Author(s):
Kotani, T. ( Toshiba Corp. (Japan) )
Ichikawa, H. ( Toshiba Microelectronics Corp. (Japan) )
Urakami, T. ( Toshiba Microelectronics Corp. (Japan) )
Nojima, S. ( Toshiba Corp. (Japan) )
Kobayashi, S. ( Toshiba Microelectronics Corp. (Japan) )
Oikawa, Y. ( Toshiba Corp. (Japan) )
Tanaka, S. ( Toshiba Corp. (Japan) )
Ikeuchi, A. ( Toshiba Microelectronics Corp. (Japan) )
Suzuki, K. ( Toshiba Corp. (Japan) )
Inoue, S. ( Toshiba Corp. (Japan) )
5 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
628
Page(to):
637
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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