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Defect repair performance using the nanomachining repair technique

Author(s):
Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Kokubo, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Nishiguchi, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
White, R. ( RAVE LLC (USA) )
Bozak, R. ( RAVE LLC (USA) )
Terrill, L. ( RAVE LLC (USA) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
520
Page(to):
527
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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