Advanced FIB mask repair technology for 100-nm/ArF lithography: II

Advanced FIB mask repair technology for 100-nm/ArF lithography: II

Author(s):

Hagiwara, R. ( Seiko Instruments, Inc. (Japan) )

Yasaka, A. ( Seiko Instruments, Inc. (Japan) )

Aita, K. ( Seiko Instruments, Inc. (Japan) )

Takaoka, O. ( Seiko Instruments, Inc. (Japan) )

Koyama, Y. ( Seiko Instruments, Inc. (Japan) )

Kozakai, T. ( Seiko Instruments, Inc. (Japan) )

Doi, T. ( Seiko Instruments, Inc. (Japan) )

Muramatsu, M. ( Seiko Instruments, Inc. (Japan) )

Suzuki, K. ( Seiko Instruments, Inc. (Japan) )

Sugiyama, Y. ( Seiko Instruments, Inc. (Japan) )

Matsuda, O. ( Seiko Instruments, Inc. (Japan) )

Okabe, M. ( Seiko Instruments, Inc. (Japan) )

Shinohara, S. ( Seiko Instruments, Inc. (Japan) )

Hasuda, M. ( Seiko Instruments, Inc. (Japan) )

Adachi, T. ( Seiko Instruments, Inc. (Japan) )

Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )

Nishiguchi, M. ( Dai Nippon Printing Co., Ltd. (Japan) )

Sato, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )

Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )

Ozawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

17 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

510

Page(to):

519

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings

Details

TDL ID:	ZA00013118
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2003 : 10th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2003.04.16-2003.04.18

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