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Evaluation of EA-PSM opaque repair on 90-nm lithography

Author(s):
Kim, D.-W. ( Photronics-PKL (South Korea) )
Lee, J.-K. ( Photronics-PKL (South Korea) )
Koo, S.H. ( Photronics-PKL (South Korea) )
Lee, D.-H. ( Photronics-PKL (South Korea) )
Kim, J.-M. ( Photronics-PKL (South Korea) )
Choi, S.-S. ( Photronics-PKL (South Korea) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. date:
2003
Page(from):
484
Page(to):
495
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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